Note that 14nm processes (which are quite old by now) are not the same as 14nm feature sizes. I'm not sure what these machines are capable of, since some details may well be lost in translation in this kind of publication. And I'm only an interested enthusiast, I don't work in the field directly.
But towards the end of the article they talk of targeting 8nm line width in 2028, which is impressive. Maybe this time around NIL actually becomes real for high-end processes?
These numbers are all mindboggling. I understand that the modern specs for EUV dont mean wire width, but if with this future NIL we truly get down to 8nm wide wires, perhaps we should start counting the number of atoms across the width of the wire (around 30).
But towards the end of the article they talk of targeting 8nm line width in 2028, which is impressive. Maybe this time around NIL actually becomes real for high-end processes?