> I was curious that they claim that lithography is done with ultraviolet, and I looked up the wavelengths involved. Sure enough, "typical" UV is still hundreds of nanometers long, like visible light. This would be too coarse for small features since you'd get diffraction at the edges of the stencil.
173nm DUV is used commercially to create features in the 20-30nm range, possibly smaller.
> I looked up UV in wikipedia and apparently they have defined "extreme UV" to be down to 10nm - which I would have called X-rays. Indeed, if 10nm is extreme UV, perhaps we can term 100nm light "underachieving X-rays".
What are you are trying to say? EUV light used in lithography (13.5nm) is close to soft x-ray light, but what does 100nm light have to do with it?
It was a typo, now corrected. I was suggesting, humorously, that 10nm light could be called both 'extreme uv' and 'underachieving xrays', since they overlap. The EM spectrum is continuous, so these distinctions and names are arbitrary, so why not have some fun?
173nm DUV is used commercially to create features in the 20-30nm range, possibly smaller.
> I looked up UV in wikipedia and apparently they have defined "extreme UV" to be down to 10nm - which I would have called X-rays. Indeed, if 10nm is extreme UV, perhaps we can term 100nm light "underachieving X-rays".
What are you are trying to say? EUV light used in lithography (13.5nm) is close to soft x-ray light, but what does 100nm light have to do with it?