100% this. People often misunderstand what technology at the governmental and university level means. The root of EUV lithography goes back 3 decades. It did originate in the US and was done at US government sponsored labs but it took 3 more decades to go from fundamental research to commercial application. Even now the yield rate isn't that great. There's still a lot of R&D to be done on EUV.
I am very glad that ASML eventually got access to information related to EUV, despite being initially excluded. Where would the world be without them and their long term investment into EUV?
This misunderstanding lead to unnecessary and destructive policies and laws that prevents scientific cooperation between countries across many different fields.
